Effect of Oxidation Pressure onCharacteristics of Fluorinated Thin Gate Oxides Prepared By Room Temperature Deposition Followed By Rapid Thermal Oxidation

By: Material type: ArticleArticleDescription: 539-545 pSubject(s): In: Proceedings ofNational Science Council, Republic of China
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Articles Articles Periodical Section Vol.22, No.04 (Jul. 1998) Available

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