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Effect of Oxidation Pressure onCharacteristics of Fluorinated Thin Gate Oxides Prepared By Room Temperature Deposition Followed By Rapid Thermal Oxidation

Yeh, Kuo-Lang Jeng, Ming-Jer Hwu, Jenn-Gwo

Effect of Oxidation Pressure onCharacteristics of Fluorinated Thin Gate Oxides Prepared By Room Temperature Deposition Followed By Rapid Thermal Oxidation - 539-545 p.

Subjects--Topical Terms:
Liquid Phase Deposition
Rapid Thermal Oxidation
Oxide Breakdown Field

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