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Influences of Buried-Oxide Interface on Inversion-Layer Mobility in Ultrathin Soi Mosfets by
  • Koga, J
  • Takagi, S.-I
  • toriumi, A
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Suppression of Stress-Induced Leakage Current after Fowler-Nordheim Stressing By Deuterium Pyrogenic Oxidation and Deuterated Poly-Si Deposition by
  • Mitani, Y
  • Satake, H
  • Itoh, H
  • toriumi, A
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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