Rf, Dc, and Reliability Characteristics of Ald Hfo2-Al2o3 Laminate Mim Capacitors for Si Rf Ic Applications

Ding, Shi-Jin Hu, Hang

Rf, Dc, and Reliability Characteristics of Ald Hfo2-Al2o3 Laminate Mim Capacitors for Si Rf Ic Applications - 886-894 p.


Automic Layer Deposit
Radio Frequency
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