Rf, Dc, and Reliability Characteristics of Ald Hfo2-Al2o3 Laminate Mim Capacitors for Si Rf Ic Applications
Ding, Shi-Jin Hu, Hang
Rf, Dc, and Reliability Characteristics of Ald Hfo2-Al2o3 Laminate Mim Capacitors for Si Rf Ic Applications - 886-894 p.
Automic Layer Deposit
Radio Frequency
Rf, Dc, and Reliability Characteristics of Ald Hfo2-Al2o3 Laminate Mim Capacitors for Si Rf Ic Applications - 886-894 p.
Automic Layer Deposit
Radio Frequency