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Simulation of Degradation of Dielectric Breakdown Field of Thermal Sio2 Films Due to Voids Si Wafers

Satoh, Yuhki Shiota, Takaaki Furuya, Hisashi

Simulation of Degradation of Dielectric Breakdown Field of Thermal Sio2 Films Due to Voids Si Wafers - 398-304 p.

Subjects--Topical Terms:
Crystal Growth
Dielectric Breakdown
Voids

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