| 000 | 00675nab a2200169Ia 4500 | ||
|---|---|---|---|
| 008 | 230808s1998 |||||||f |||| 00| 0 eng d | ||
| 100 |
_aYeh, Kuo-Lang _9859764 |
||
| 100 |
_aJeng, Ming-Jer _9776302 |
||
| 100 |
_aHwu, Jenn-Gwo _9776300 |
||
| 245 | 0 | _aEffect of Oxidation Pressure onCharacteristics of Fluorinated Thin Gate Oxides Prepared By Room Temperature Deposition Followed By Rapid Thermal Oxidation | |
| 300 | _a539-545 p. | ||
| 650 |
_aLiquid Phase Deposition _9701039 |
||
| 650 |
_aRapid Thermal Oxidation _9859765 |
||
| 650 |
_aOxide Breakdown Field _9859766 |
||
| 773 |
_d1998 _tProceedings ofNational Science Council, Republic of China _x02556588 |
||
| 942 |
_cART _o51 _pABUL KALAM Library |
||
| 999 |
_c800908 _d800908 |
||