| 000 | 00460nab a2200157Ia 4500 | ||
|---|---|---|---|
| 008 | 230808s2002 |||||||f |||| 00| 0 eng d | ||
| 100 |
_aGolan, G. _9811793 |
||
| 100 |
_aAxelevitch, A. _9811794 |
||
| 245 | 0 | _aNovel Method of Low-Vaccum Plasma Triode Sputtering | |
| 300 | _a651-658 p. | ||
| 650 |
_aTetrode Sputtering _9820252 |
||
| 650 | _aSilicon | ||
| 650 |
_aTitanium Iron _9812322 |
||
| 773 |
_d2002 _tMicroelectronics Journal _x00262692 |
||
| 942 |
_cART _o51 _pABUL KALAM Library |
||
| 999 |
_c771212 _d771212 |
||