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_aDing, Shi-Jin _9807532 |
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| 100 |
_aHu, Hang _9722447 |
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| 245 | 0 | _aRf, Dc, and Reliability Characteristics of Ald Hfo2-Al2o3 Laminate Mim Capacitors for Si Rf Ic Applications | |
| 300 | _a886-894 p. | ||
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_aAutomic Layer Deposit _9807533 |
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| 650 |
_aRadio Frequency _990505 |
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_d2004 _tIeee Transactions on Electron Devices _x00189383 |
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