000 00503nab a2200145Ia 4500
008 230808s2004 |||||||f |||| 00| 0 eng d
100 _aXiong, Shiying
_9797111
100 _aBoker, Jeff
_9803373
245 2 _aA Simulation Study of Gate Line Edge Roughness Effects on Doping Profiles of Short-Channel Mosfet Devices
300 _a228-232 p.
650 _aDoping
_9725227
650 _aGate Line Edge Roughness
_9803374
773 _d2004
_tIeee Journal of Solid-State Circuits
_x00189200
942 _cART
_o51
_pABUL KALAM Library
999 _c757686
_d757686