| 000 | 00555nab a2200157Ia 4500 | ||
|---|---|---|---|
| 008 | 230808s1998 |||||||f |||| 00| 0 eng d | ||
| 100 |
_aEriguchi, Koji _9778051 |
||
| 100 |
_aKosaka, Yukiko _9778053 |
||
| 245 | 0 | _aCorrelation Between Two Time-Dependent Dielectric Breakdown Measurements for Gate Oxides Damaged by Plama Processing | |
| 300 | _a160-164 p. | ||
| 650 |
_aCorrelation _9174781 |
||
| 650 |
_aDielectric Breakdown _9742641 |
||
| 650 |
_aGate Oxide _9777258 |
||
| 773 |
_d1998 _tIEEE Transactions on Electron Devices _x00189383 |
||
| 942 |
_cART _o51 _pABUL KALAM Library |
||
| 999 |
_c744826 _d744826 |
||