| 000 | 00539nab a2200157Ia 4500 | ||
|---|---|---|---|
| 008 | 230808s2011 |||||||f |||| 00| 0 eng d | ||
| 100 |
_aHofmann, M. _9744898 |
||
| 100 |
_aSavan, Alan _9744899 |
||
| 245 | 0 | _aEnhanced Photoelectrochemical Properties of Wo3 Thin Films Fabricated by Reactive Magnetron Sputtering | |
| 300 | _a4724-4731 p. | ||
| 650 |
_aTungsten Oxide _9719149 |
||
| 650 |
_aPhotocurrent _9702807 |
||
| 650 |
_aHigh Throughput _9724732 |
||
| 773 |
_d2011 _tInternational Journal of Hydrogen Energy _x03603199 |
||
| 942 |
_cART _o51 _pABUL KALAM Library |
||
| 999 |
_c729258 _d729258 |
||