| 000 | 00591nab a2200169Ia 4500 | ||
|---|---|---|---|
| 008 | 230808s2014 |||||||f |||| 00| 0 eng d | ||
| 100 |
_aJee, Sung Chul _9709247 |
||
| 100 |
_aLee, Moojae _9709248 |
||
| 100 |
_aKim, Do Wan _9709249 |
||
| 245 | 0 | _aFe Analysis of Plasma Discharge and Sheath Characterization in Dry Etching Reactor | |
| 300 | _a307-312 p. | ||
| 650 |
_aFault Detection and Isolation (Fdi) _9709250 |
||
| 650 |
_aTime Delay _9165521 |
||
| 650 |
_aParameters Uncertainty _9709251 |
||
| 773 |
_d2014 _tJournal of Electrical Engineering and Technology _x19750102 |
||
| 942 |
_cART _o51 _pABUL KALAM Library |
||
| 999 |
_c712766 _d712766 |
||