000 | 00723nam a2200229Ia 4500 | ||
---|---|---|---|
008 | 990712s1993||||xx |||||||||||||| ||eng|| | ||
020 | _a0750691727 | ||
022 | _l0-7506-9172-7 | ||
041 | _aeng | ||
082 |
_a620.193 _bSTR |
||
100 |
_aStrausser, Yale _eED _9107367 |
||
245 | 0 | _aCharacterization in Silicon Processing | |
260 |
_aBoston : _bButterworth-Heinemann, _cc1993 |
||
300 | _aXIII, 240 p. | ||
440 |
_aMaterials Characterization Series _994099 |
||
504 | _aNN | ||
650 |
_aElectric Conductors _9107368 |
||
650 |
_aSemiconductor Films _9107369 |
||
650 | _aSilicon | ||
856 |
_yTable of Contents _uhttps://eaklibrary.neduet.edu.pk:8443/catalog/bk/books/toc/0-7506-9172-7.pdf |
||
942 |
_cBOO _o51 _pAbul Kalam Library |
||
999 |
_c392722 _d392722 |