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The Teos Oxide Deposited on Phosphorus in Doped Polysilicon with Rapid Thermal Annealing In by
  • Kao, Chyuan-Haur
  • Lai, Chao-Sung
  • Lee, Chung-Len
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Argon Ion -Implantation on Polysilicon Or Amorphous-Silicon for Boron Penetration Suppression in P Pmosfet by
  • Lee, Lurng Shehng
  • Lee, Chung Len
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
A Physical Simulation Model for Field Emission Triode by
  • Lu, Chih-Wen
  • Lee, Chung Len
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
The Effectiveness of Aluminum Mask for Patterning Semi Insulating Regions on Si Wafer Under Mev Proton Bombardment by
  • Lee, Chung Len
  • Lee, Lurng Shehng
  • Tang, Denny Duan-Lee
Source: Proceedings ofNational Science Council, Republic of China
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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