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Sodel Fet: Novelchannel and Source/Drain Profile Engineering Schemes By Selective Si Epitaxial Growth Technology by
  • Inaba, S
  • Miyano, Shinji
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Thermally Robust Hfn Metal As A Promising Gate Electrode for Advanced Mos Device Applications by
  • Yu Yu, Hong
  • Li, Ming-Fu
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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