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A Steady Stated Drain Current Technique for Generation and Recombinaton lifetime Measurement InSoi Mosfet by
  • Cheng, Zhi-Uuan
  • ling, C. H
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
The Role of Electron Traps onPost-Stress Interface Trap Generation in Hot-Carrier Stressed P-Mosfet'S by
  • Ang, D. S
  • ling, C. H
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
A Unified Model for Self-limiting Hot-Carrier Degradation in Ldd N-Mosfet'S by
  • Ang, D. S
  • ling, C. H
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
A Modified Lucky Electron Model for Impact Ionization Rate in Nmosfet'S at 77 K by
  • ling, C. H
  • See, lin Ming
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
U Nified Model for Self-limiting Hot-Carrier Degradation in Ldd N-Mopdfet'S by
  • Ang, D. S
  • ling, C. H
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
A Comparison of Hot-Carrier Degradation in Tungsten Polycide Gate and Poly Gate P-Mosfet'S by
  • Ang, D. S
  • ling, C. H
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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