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A Closed- Form Back-Gate-Bias Related Inverse Narrow-Channel Effect Model for Deep-Submicron Vlsi Cmos Devices Using Shaliow Trench Isolation by
  • lin, Shih-Chieh
  • Kuo, James B
  • Sun, Shih-Wei
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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A Material Removal Model for Polishing Glass-Ceramic and Aluminum Magnesium Storage Disks by
  • Wang, C. C
  • Lin, Shih-Chieh
Source: International Journal of Machine tools & Manufacture: Design, Research and Application
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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