Yu, H. Y Hou, Y.-T Li, M.-F Kwong, D.-L <br/><br/>
Investigation of Hole-Tunneling Current Through Ultrathin Oxynitride/Oxide Stack Gate Dielectrics in P-Mosfets 

 - 1158-1164 p. 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Hole Tunneling Current<br/>Mosfet<br/>No Stack