Ding, Shi-Jin Hu, Hang <br/><br/>
Rf, Dc, and Reliability Characteristics of Ald Hfo2-Al2o3 Laminate Mim Capacitors  for  Si Rf Ic Applications 

 - 886-894 p. 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Automic Layer Deposit<br/>Radio Frequency