Kuo, Chih-Sheng Hsu, Jui-Feng. <br/><br/>
High-Al2o3 Gate Dielectrics Prepared By Oxidation of Aluminium Film in Nitric Acid Followed By High-Temperature Annealing 

 - 854-858 p. 
<br/><br/><label>Subjects--Topical Terms: </label><br/>High-K Gate Dielectric<br/>Mos Capacitors<br/>Nitric Acid