Chong, Yung Fu Gossmann, Hans-Joachim <br/><br/>
Lsser Thermal Processing of Amphous Silicon Gates to Reduce Poly-Depletion in Cmos Devices 

 - 669-676 p. 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Boron Penetration<br/>Gate Oxide