Satoh, Yuhki Shiota, Takaaki Furuya, Hisashi <br/><br/>
Simulation of Degradation of Dielectric Breakdown Field of Thermal Sio2 Films Due to Voids Si Wafers 

 - 398-304 p. 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Crystal Growth<br/>Dielectric Breakdown<br/>Voids