Eriguchi, Koji Kosaka, Yukiko <br/><br/>
Correlation Between Two Time-Dependent Dielectric Breakdown Measurements  for Gate Oxides Damaged by Plama Processing 

 - 160-164 p. 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Correlation<br/>Dielectric Breakdown<br/>Gate Oxide