Osten, H. J. Knoli, G Heinemann, B. <br/><br/>
Increasing Process Margin in Sige Heterojunction Bipolar Technology by Adding Carbon 

 - 1910-1912 p. 
<br/><br/><label>Subjects--Topical Terms: </label><br/>High Frequency<br/>High Efficiency Video Coding (Hevc)<br/>Heterogeneous