A Robust All-Wet-Etching Process for Mesa for mation of Ingaas-Inp Hbt Featuring High Uni for mity and High Reproducibility

By: Material type: ArticleArticleDescription: 1234-1240 pSubject(s): In: Ieee Transactions on Electron Devices
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Item type Current library Call number Vol info Status Date due Barcode
Articles Articles Periodical Section Vol.51, No.08 (Aug. 2004) Available

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