Novel Method of Low-Vaccum Plasma Triode Sputtering (Record no. 771212)

MARC details
000 -LEADER
fixed length control field 00460nab a2200157Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 230808s2002 |||||||f |||| 00| 0 eng d
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Golan, G.
9 (RLIN) 811793
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Axelevitch, A.
9 (RLIN) 811794
245 #0 - TITLE STATEMENT
Title Novel Method of Low-Vaccum Plasma Triode Sputtering
300 ## - PHYSICAL DESCRIPTION
Extent 651-658 p.
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Tetrode Sputtering
9 (RLIN) 820252
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Silicon
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Titanium Iron
9 (RLIN) 812322
773 ## - HOST ITEM ENTRY
Place, publisher, and date of publication 2002
Title Microelectronics Journal
International Standard Serial Number 00262692
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type Articles
-- 51
-- ABUL KALAM Library
Holdings
Not for loan Home library Serial Enumeration / chronology Total Checkouts Date last seen Koha item type
  Engr Abul Kalam Library Vol.33, No.08 (Aug. 2002)   19/08/2023 Articles
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