Enhanced Photoelectrochemical Properties of Wo3 Thin Films Fabricated by Reactive Magnetron Sputtering (Record no. 729258)

MARC details
000 -LEADER
fixed length control field 00539nab a2200157Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 230808s2011 |||||||f |||| 00| 0 eng d
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Hofmann, M.
9 (RLIN) 744898
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Savan, Alan
9 (RLIN) 744899
245 #0 - TITLE STATEMENT
Title Enhanced Photoelectrochemical Properties of Wo3 Thin Films Fabricated by Reactive Magnetron Sputtering
300 ## - PHYSICAL DESCRIPTION
Extent 4724-4731 p.
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Tungsten Oxide
9 (RLIN) 719149
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Photocurrent
9 (RLIN) 702807
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element High Throughput
9 (RLIN) 724732
773 ## - HOST ITEM ENTRY
Place, publisher, and date of publication 2011
Title International Journal of Hydrogen Energy
International Standard Serial Number 03603199
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type Articles
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-- ABUL KALAM Library
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  Engr Abul Kalam Library Vol.36, No.08 (Apr. 2011)   19/08/2023 Articles
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