Optimization of A 0.6 Um, Single Polysilicon Emitter Bipolar Technology Versus Narrow Emitter Effects
Ullan, M. Lozano, M. Santander, J. Tamayo, E. Lora
Optimization of A 0.6 Um, Single Polysilicon Emitter Bipolar Technology Versus Narrow Emitter Effects - 659-666 p.
Bipolar Transistor
Semi Conductor Device Fabrication
Semiconductor Device Metallization
Optimization of A 0.6 Um, Single Polysilicon Emitter Bipolar Technology Versus Narrow Emitter Effects - 659-666 p.
Bipolar Transistor
Semi Conductor Device Fabrication
Semiconductor Device Metallization