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Thickness Dependent Dielectric Breakdown of Pecvd Low-K Carbon Doped Silicon Dioxide Dielectric Thin Films: Modeling and Experiments

Zhou, H Shi, F.G. Zhao, Banghua

Thickness Dependent Dielectric Breakdown of Pecvd Low-K Carbon Doped Silicon Dioxide Dielectric Thin Films: Modeling and Experiments - 259-264 p.

Subjects--Topical Terms:
Thickness Dependent
Dielectric
Plasma

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